XUV多層反射鏡（EUV多層反射鏡）
基板形狀：平面、凸形、凹形、拋物面、超環(huán)面、橢圓面
基板材料：石英、硅、zero dewer等
多層膜材料：Mo/Si（50eV至100eV）、Ru/Si（50eV至100eV）、Zr/Al（50eV至70eV）、SiC/Mg（25eV至50eV）、Cr/C（至300eV）等
基板尺寸：φ3毫米至φ300毫米（標(biāo)準(zhǔn)值為1英寸）
產(chǎn)品示例
Mo/Si多層反射鏡具有接近13納米（90電子伏）波長(zhǎng)的高反射率。Mo/Si多層反射鏡具有高達(dá)70％的正入射反射率。
XUV反射鏡的材料、膜結(jié)構(gòu)和基板形狀可以定制以滿(mǎn)足用戶(hù)有關(guān)中心波長(zhǎng)和光學(xué)裝置的需求。
Φ10毫米平面反射鏡 |
測(cè)量的Mo/Si多層的反射率 （正入射角：2度） |
用于泵浦探測(cè)試驗(yàn)的多層反射鏡 |
測(cè)量寬帶反射鏡、 窄帶反射鏡（波長(zhǎng)：30納米）的反射率 |
EUV寬帶橢圓面反射鏡 | |
規(guī)格參數(shù)
No | Design name | AOI | pol. | peak energy | reflectivit | bandwidth (FWHM) | ||
1 | HR-98-3.4 | 5 deg | s | 98 eV | 12.7 nm | 67.7% | 3.4 eV | (0.4 nm) |
2 | HR-95-3.8 | 5 deg | s | 95 eV | 13.1 nm | 67.7% | 3.8 eV | (0.5 nm) |
3 | HR-90-3.8 | 5 deg | s | 90 eV | 13.8 nm | 68.0% | 3.8 eV | (0.6 nm) |
4 | HR-85-4.0 | 5 deg | s | 85 eV | 14.6 nm | 66.8% | 4.0 eV | (0.7 nm) |
5 | HR-80-4.0 | 5 deg | s | 80 eV | 15.5 nm | 63.3% | 4.0 eV | (0.8 nm) |
6 | HR-75-4.6 | 5 deg | s | 75 eV | 16.5 nm | 54.5% | 4.6 eV | (1.0 nm) |
7 | HR-70-5.0 | 5 deg | s | 70 eV | 17.7 nm | 47.5% | 5 eV | (1.2 nm) |
8 | HR-70-2.6 | 5 deg | s | 70 eV | 17.7 nm | 52.1% | 2.6 eV | (0.7 nm) |
9 | HR-65-2.6 | 5 deg | s | 65 eV | 19.1 nm | 48.5% | 2.6 eV | (0.8 nm) |
10 | HR-60-2.8 | 5 deg | s | 60 eV | 20.7 nm | 43.7% | 2.8 eV | (1.0 nm) |
11 | HR-55-3.6 | 5 deg | s | 55 eV | 22.5 nm | 37.3% | 3.6 eV | (1.5 nm) |
12 | HR-50-4.2 | 5 deg | s | 50 eV | 24.8 nm | 30.9% | 4.2 eV | (2.1 nm) |
13 | HR-48-2.0 | 5 deg | s | 48 eV | 25.8 nm | 50.6% | 2.0 eV | (1.1 nm) |
14 | HR-45-2.4 | 5 deg | s | 45 eV | 27.6 nm | 48.4% | 2.4 eV | (1.4 nm) |
15 | HR-40-2.6 | 5 deg | s | 40 eV | 31.0 nm | 44.8% | 2.6 eV | (2.0 nm) |
16 | HR-35-2.6 | 5 deg | s | 35 eV | 35.4 nm | 43.1% | 2.6 eV | (2.6 nm) |
17 | HR-30-3.0 | 5 deg | s | 30 eV | 41.3 nm | 41.2% | 3.0 eV | (4.1 nm) |
18 | HR45-90-6.0 | 45 deg | s | 90 eV | 13.1 nm | 66.1% | 6.0 eV | (0.9 nm) |
19 | HR45-80-7.4 | 45 deg | s | 80 eV | 15.5 nm | 60.0% | 7.4 eV | (1.4 nm) |
20 | HR45-70-36.0 | 45 deg | s | 70 eV | 17.7 nm | 49.0% | 3.6 eV | (0.9 nm) |
21 | HR45-60-5.4 | 45 deg | s | 60 eV | 20.7 nm | 40.8% | 5.4 eV | (1.8 nm) |
22 | HR45-50-10.0 | 45 deg | s | 50 eV | 24.8 nm | 30.0% | 10.0 eV | (5.1 nm) |
23 | HR45-40-5.0 | 45 deg | s | 40 eV | 31.0 nm | 44.4% | 5.0 eV | (3.8 nm) |
24 | HR45-30-7.0 | 45 deg | s | 30 eV | 41.3 nm | 42.5% | 7.0 eV | (9.3 nm) |
典型應(yīng)用
天文學(xué)
XUV光電子光譜
XUV顯微
EUV光刻
等離子體物理
阿秒科學(xué)
No | Design name | AOI | pol. | peak energy | reflectivit | bandwidth (FWHM) | ||
1 | HR-98-3.4 | 5 deg | s | 98 eV | 12.7 nm | 67.7% | 3.4 eV | (0.4 nm) |
2 | HR-95-3.8 | 5 deg | s | 95 eV | 13.1 nm | 67.7% | 3.8 eV | (0.5 nm) |
3 | HR-90-3.8 | 5 deg | s | 90 eV | 13.8 nm | 68.0% | 3.8 eV | (0.6 nm) |
4 | HR-85-4.0 | 5 deg | s | 85 eV | 14.6 nm | 66.8% | 4.0 eV | (0.7 nm) |
5 | HR-80-4.0 | 5 deg | s | 80 eV | 15.5 nm | 63.3% | 4.0 eV | (0.8 nm) |
6 | HR-75-4.6 | 5 deg | s | 75 eV | 16.5 nm | 54.5% | 4.6 eV | (1.0 nm) |
7 | HR-70-5.0 | 5 deg | s | 70 eV | 17.7 nm | 47.5% | 5 eV | (1.2 nm) |
8 | HR-70-2.6 | 5 deg | s | 70 eV | 17.7 nm | 52.1% | 2.6 eV | (0.7 nm) |
9 | HR-65-2.6 | 5 deg | s | 65 eV | 19.1 nm | 48.5% | 2.6 eV | (0.8 nm) |
10 | HR-60-2.8 | 5 deg | s | 60 eV | 20.7 nm | 43.7% | 2.8 eV | (1.0 nm) |
11 | HR-55-3.6 | 5 deg | s | 55 eV | 22.5 nm | 37.3% | 3.6 eV | (1.5 nm) |
12 | HR-50-4.2 | 5 deg | s | 50 eV | 24.8 nm | 30.9% | 4.2 eV | (2.1 nm) |
13 | HR-48-2.0 | 5 deg | s | 48 eV | 25.8 nm | 50.6% | 2.0 eV | (1.1 nm) |
14 | HR-45-2.4 | 5 deg | s | 45 eV | 27.6 nm | 48.4% | 2.4 eV | (1.4 nm) |
15 | HR-40-2.6 | 5 deg | s | 40 eV | 31.0 nm | 44.8% | 2.6 eV | (2.0 nm) |
16 | HR-35-2.6 | 5 deg | s | 35 eV | 35.4 nm | 43.1% | 2.6 eV | (2.6 nm) |
17 | HR-30-3.0 | 5 deg | s | 30 eV | 41.3 nm | 41.2% | 3.0 eV | (4.1 nm) |
18 | HR45-90-6.0 | 45 deg | s | 90 eV | 13.1 nm | 66.1% | 6.0 eV | (0.9 nm) |
19 | HR45-80-7.4 | 45 deg | s | 80 eV | 15.5 nm | 60.0% | 7.4 eV | (1.4 nm) |
20 | HR45-70-36.0 | 45 deg | s | 70 eV | 17.7 nm | 49.0% | 3.6 eV | (0.9 nm) |
21 | HR45-60-5.4 | 45 deg | s | 60 eV | 20.7 nm | 40.8% | 5.4 eV | (1.8 nm) |
22 | HR45-50-10.0 | 45 deg | s | 50 eV | 24.8 nm | 30.0% | 10.0 eV | (5.1 nm) |
23 | HR45-40-5.0 | 45 deg | s | 40 eV | 31.0 nm | 44.4% | 5.0 eV | (3.8 nm) |
24 | HR45-30-7.0 | 45 deg | s | 30 eV | 41.3 nm | 42.5% | 7.0 eV | (9.3 nm) |
天文學(xué)
XUV光電子光譜
XUV顯微
EUV光刻
等離子體物理
阿秒科學(xué)