XUV多層反射鏡（EUV多層反射鏡）
基板形狀：平面、凸形、凹形、拋物面、超環(huán)面、橢圓面
基板材料：石英、硅、zero dewer等
多層膜材料：Mo/Si（50eV至100eV）、Ru/Si（50eV至100eV）、Zr/Al（50eV至70eV）、SiC/Mg（25eV至50eV）、Cr/C（至300eV）等
基板尺寸：φ3毫米至φ300毫米（標(biāo)準(zhǔn)值為1英寸）
產(chǎn)品示例
Mo/Si多層反射鏡具有接近13納米（90電子伏）波長的高反射率。Mo/Si多層反射鏡具有高達(dá)70％的正入射反射率。
XUV反射鏡的材料、膜結(jié)構(gòu)和基板形狀可以定制以滿足用戶有關(guān)中心波長和光學(xué)裝置的需求。
Φ10毫米平面反射鏡 |
測量的Mo/Si多層的反射率 （正入射角：2度） |
用于泵浦探測試驗的多層反射鏡 |
測量寬帶反射鏡、 窄帶反射鏡（波長：30納米）的反射率 |
EUV寬帶橢圓面反射鏡 | |
規(guī)格參數(shù)
No | Design name | AOI | pol. | peak energy | reflectivity | bandwidth (FWHM) | ||
1 | NBR-98-2.3 | 5 deg | s | 98 eV | 12.7 nm | 39.5% | 2.3 eV | (0.3 nm) |
2 | NBR-95-2.6 | 5 deg | s | 95 eV | 13.1 nm | 40.7% | 2.6 eV | (0.4 nm) |
3 | NBR-90-2.5 | 5 deg | s | 90 eV | 13.8 nm | 44.5% | 2.5 eV | (0.4 nm) |
4 | NBR-85-2.5 | 5 deg | s | 85 eV | 14.6 nm | 48.5% | 2.5 eV | (0.4 nm) |
5 | NBR-80-2.5 | 5 deg | s | 80 eV | 15.5 nm | 50.1% | 2.5 eV | (0.5 nm) |
6 | NBR-75-2.6 | 5 deg | s | 75 eV | 16.5 nm | 46.0% | 2.6 eV | (0.6 nm) |
7 | NBR-70-1.9 | 5 deg | s | 70 eV | 17.7 nm | 43.7% | 1.9 eV | (0.5 nm) |
8 | NBR-65-2.1 | 5 deg | s | 65 eV | 19.1 nm | 43.5% | 2.1 eV | (0.6 nm) |
9 | NBR-60-2.2 | 5 deg | s | 60 eV | 20.7 nm | 42.2% | 2.2 eV | (0.8 nm) |
10 | NBR-55-2.2 | 5 deg | s | 55 eV | 22.5 nm | 38.4% | 2.2 eV | (1.0 nm) |
11 | NBR-50-2.7 | 5 deg | s | 50 eV | 24.8 nm | 33.5% | 2.7 eV | (1.3 nm) |
12 | NBR-48-1.3 | 5 deg | s | 48 eV | 25.8 nm | 49.2% | 1.3 eV | (0.7 nm) |
13 | NBR-45-1.5 | 5 deg | s | 45 eV | 27.6 nm | 47.6% | 1.5 eV | (0.9 nm) |
14 | NBR-40-1.5 | 5 deg | s | 40 eV | 31.0 nm | 44.8% | 1.5 eV | (1.1 nm) |
15 | NBR-35-1.6 | 5 deg | s | 35 eV | 35.4 nm | 43.7% | 1.6 eV | (1.6 nm) |
16 | NBR-30-1.9 | 5 deg | s | 30 eV | 41.3 nm | 42.0% | 1.9 eV | (2.6 nm) |
17 | NBR45-90-3.1 | 45 deg | s | 90 eV | 12.7 nm | 53.2% | 3.1 eV | (0.5 nm) |
18 | NBR45-80-3.6 | 45 feg | s | 80 eV | 15.5 nm | 52.3% | 3.6 eV | (0.7 nm) |
19 | NBR45-70-2.6 | 45 feg | s | 70 eV | 17.7 nm | 45.6% | 2.6 eV | (0.7 nm) |
20 | NBR45-60-3.7 | 45 feg | s | 60 eV | 20.7 nm | 41.1% | 3.7 eV | (1.3 nm) |
21 | NBR45-50-5.5 | 45 feg | s | 50 eV | 24.8 nm | 32.2% | 5.5 eV | (2.7 nm) |
22 | NBR45-40-2.9 | 45 feg | s | 40 eV | 31.0 nm | 46.5% | 2.9 eV | (2.2 nm) |
23 | NBR45-30-3.8 | 45 feg | s | 30 eV | 41.3 nm | 44.1% | 3.8 eV | (5.1 nm) |
典型應(yīng)用
天文學(xué)
XUV光電子光譜
XUV顯微
EUV光刻
等離子體物理
阿秒科學(xué)
No | Design name | AOI | pol. | peak energy | reflectivity | bandwidth (FWHM) | ||
1 | NBR-98-2.3 | 5 deg | s | 98 eV | 12.7 nm | 39.5% | 2.3 eV | (0.3 nm) |
2 | NBR-95-2.6 | 5 deg | s | 95 eV | 13.1 nm | 40.7% | 2.6 eV | (0.4 nm) |
3 | NBR-90-2.5 | 5 deg | s | 90 eV | 13.8 nm | 44.5% | 2.5 eV | (0.4 nm) |
4 | NBR-85-2.5 | 5 deg | s | 85 eV | 14.6 nm | 48.5% | 2.5 eV | (0.4 nm) |
5 | NBR-80-2.5 | 5 deg | s | 80 eV | 15.5 nm | 50.1% | 2.5 eV | (0.5 nm) |
6 | NBR-75-2.6 | 5 deg | s | 75 eV | 16.5 nm | 46.0% | 2.6 eV | (0.6 nm) |
7 | NBR-70-1.9 | 5 deg | s | 70 eV | 17.7 nm | 43.7% | 1.9 eV | (0.5 nm) |
8 | NBR-65-2.1 | 5 deg | s | 65 eV | 19.1 nm | 43.5% | 2.1 eV | (0.6 nm) |
9 | NBR-60-2.2 | 5 deg | s | 60 eV | 20.7 nm | 42.2% | 2.2 eV | (0.8 nm) |
10 | NBR-55-2.2 | 5 deg | s | 55 eV | 22.5 nm | 38.4% | 2.2 eV | (1.0 nm) |
11 | NBR-50-2.7 | 5 deg | s | 50 eV | 24.8 nm | 33.5% | 2.7 eV | (1.3 nm) |
12 | NBR-48-1.3 | 5 deg | s | 48 eV | 25.8 nm | 49.2% | 1.3 eV | (0.7 nm) |
13 | NBR-45-1.5 | 5 deg | s | 45 eV | 27.6 nm | 47.6% | 1.5 eV | (0.9 nm) |
14 | NBR-40-1.5 | 5 deg | s | 40 eV | 31.0 nm | 44.8% | 1.5 eV | (1.1 nm) |
15 | NBR-35-1.6 | 5 deg | s | 35 eV | 35.4 nm | 43.7% | 1.6 eV | (1.6 nm) |
16 | NBR-30-1.9 | 5 deg | s | 30 eV | 41.3 nm | 42.0% | 1.9 eV | (2.6 nm) |
17 | NBR45-90-3.1 | 45 deg | s | 90 eV | 12.7 nm | 53.2% | 3.1 eV | (0.5 nm) |
18 | NBR45-80-3.6 | 45 feg | s | 80 eV | 15.5 nm | 52.3% | 3.6 eV | (0.7 nm) |
19 | NBR45-70-2.6 | 45 feg | s | 70 eV | 17.7 nm | 45.6% | 2.6 eV | (0.7 nm) |
20 | NBR45-60-3.7 | 45 feg | s | 60 eV | 20.7 nm | 41.1% | 3.7 eV | (1.3 nm) |
21 | NBR45-50-5.5 | 45 feg | s | 50 eV | 24.8 nm | 32.2% | 5.5 eV | (2.7 nm) |
22 | NBR45-40-2.9 | 45 feg | s | 40 eV | 31.0 nm | 46.5% | 2.9 eV | (2.2 nm) |
23 | NBR45-30-3.8 | 45 feg | s | 30 eV | 41.3 nm | 44.1% | 3.8 eV | (5.1 nm) |
天文學(xué)
XUV光電子光譜
XUV顯微
EUV光刻
等離子體物理
阿秒科學(xué)